Semiconductor measuring device using beam displacer

A semiconductor measuring device comprising:

• a first light source configured to output first light having a first polarization component;
• a second light source configured to output second light having a second polarization component that is different from the first polarization component;
• a first beam splitter configured to output first combined light and second combined light, each comprising the first light and the second light;
• a beam displacer configured to receive the first combined light and separate the first combined light into the first light and the second light;
• a camera configured to obtain a first interference pattern and a second interference pattern, the first interference pattern being based on the first light and a reflected light of the second combined light reflected from a first surface of a measurement object, and the second interference pattern being based on the second light and the reflected light;
• and
• a computing device configured to compute first height information of a first point included in the first surface based on the first interference pattern and the second interference pattern.

A semiconductor measuring device comprising:

• a first light source configured to output first light having a first optical characteristic;
• a second light source configured to output second light having a second optical characteristic;
• a first beam splitter configured to generate first combined light and second combined light, each comprising the first light and the second light;
• a beam displacer configured to receive the first combined light and separate the first combined light into the first light and the second light based on the first optical characteristic and the second optical characteristic;
• a camera configured to obtain a first interference pattern and a second interference pattern, the first interference pattern being based on the first light and a reflected light of the second combined light reflected from a first surface of a measurement object, and the second interference pattern being based on the second light and the reflected light;
• and
• a computing device configured to compute first height information of a first point included in the first surface based on the first interference pattern and the second interference pattern.