Extreme ultraviolet lithography tool
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYu-Huan CHEN, Cheng-Hsuan WU, Ming-Hsun TSAI, Shang-Chieh CHIEN, Li-Jui CHEN
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Abstract
A photolithographic apparatus includes a droplet generator, a droplet generator maintenance system, and a controller communicating with the droplet generator maintenance system. The droplet generator maintenance system operatively communicates with the droplet generator, a coolant distribution unit, a gas supply unit, and a supporting member. The gas supply unit includes a heat exchange assembly and an air heating assembly. The coolant distribution unit is configured to control the temperature of the droplet generator within the acceptable droplet generator range.
Claims20
An extreme ultraviolet (EUV) lithography tool, comprising:
- a droplet generator including an interior reservoir configured to hold a molten metal;
- a feed line connected to the interior reservoir;
- and
- a droplet generator maintenance (DGM) system configured to feed a gas through the feed line and into the interior reservoir to adjust a temperature of the droplet generator.
An extreme ultraviolet (EUV) lithography tool, comprising:
- a droplet generator including an interior reservoir configured to hold a molten metal;
- and
- a droplet generator maintenance (DGM) system configured to feed a gas to the interior reservoir to adjust a temperature of the droplet generator.
An extreme ultraviolet (EUV) lithography tool, comprising:
- a droplet generator including an interior reservoir configured to store a molten metal;
- and
- a supply manifold configured to supply a pressurized gas to the interior reservoir.
Dependencies are inferred from the claim text.