Epi isolation plate and parallel block purge flow tuning for growth rate and uniformity

A processing chamber comprising:

• a chamber body;
• an upper window and a lower window disposed within the chamber body, the upper window and the lower window at least partially defining a processing volume;
• a substrate support disposed within the processing volume;
• and
• an isolation plate disposed within the processing volume, the isolation plate having a first face and a second face opposing the first face, the isolation plate having one or more perforations extending through the first face to the second face, the isolation plate at least partially fluidly isolating an upper portion of the processing volume from a lower portion of the processing volume.

A flow guide applicable for use in semiconductor manufacturing, the flow guide comprising:

• an isolation plate having a first face and a second face opposing the first face, the isolation plate having one or more perforations extending through the first face to the second face, the isolation plate comprising a transparent material;
• a first parallel block extending from the second face, the first parallel block having a first face approximately perpendicular to the second face of the isolation plate;
• and
• a second parallel block extending from the second face, the second parallel block set spaced from the first parallel block to define a flow path between the first parallel block and the second parallel block, the second parallel block having a first face approximately perpendicular to the second face of the isolation plate, the first parallel block and the second parallel block comprising an opaque material.