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US 2025/0320439 A1Published application
Cleaning composition and method of forming photoresist pattern using the same
AssigneeDongwoo Fine-Chem Co., Ltd.
InventorsBAEK HYUN CHO, GI JIN KWUN, HYUNG SUB CHOI
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Abstract
A cleaning composition includes an alcohol solvent and zeolite. The content of the zeolite is greater than 0 and equal to or less than 1 ppb based on the total weight of the cleaning composition. The cleaning composition may exhibit improved temporal stability and improved cleaning performance of semiconductor substrate residues.
Claims11
A cleaning composition comprising:
- an alcohol solvent;
- and
- zeolite,
- wherein a content of the zeolite is greater than 0 and equal to or less than 1 part per billion (ppb) based on a total weight of the cleaning composition.
1 more element
Dependencies are inferred from the claim text.