Method for the production of a single-crystal film, in particular piezoelectric
AssigneeSoitec
InventorsBruno Ghyselen, Jean-Marc Bethoux
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AssigneeSoitec
InventorsBruno Ghyselen, Jean-Marc Bethoux
Estimating the term…
A method of manufacturing a monocrystalline layer comprises the following successive steps: providing a donor substrate comprising a piezoelectric material of composition ABO3, where A consists of at least one element from among Li, Na, K, H, Ca; and B consists of at least one element from among Nb, Ta, Sb, V; providing a receiver substrate, transferring a layer called the “seed layer” from the donor substrate on to the receiver substrate, such that the seed layer is at the bonding interface, followed by thinning of the donor substrate layer; and growing a monocrystalline layer of composition A′B′O3 on piezoelectric material ABO3 of the seed layer, where A′ consists of a least one of the following elements Li, Na, K, H; B′ consists of a least one of the following elements Nb, Ta, Sb, V; and A′ is different from A or B′ is different from B.
A substrate for a microelectronic, photonic or optical device, comprising:
Dependencies are inferred from the claim text.