Chemical vapor deposition method of depositing iridium oxide on neural probe, provided on flexible printed circuit board, using ozone gas

Abstract

Disclosed is a chemical vapor deposition method of depositing iridium oxide on a neural probe, provided on a flexible printed circuit board, using ozone gas, the chemical vapor deposition method including: step S100 of introducing an iridium precursor into a reaction chamber (furnace) in which a printed circuit board having a neural probe provided thereon is placed, and purging the inside of the reaction chamber with an inert gas for a predetermined time; and step S200 of introducing ozone (O3) gas and an inert gas into the reaction chamber, and reacting the iridium precursor with the ozone gas at a predetermined reaction temperature, thereby depositing iridium oxide (IrO2) on the surface of the neural probe.

Dependencies are inferred from the claim text.