Mirror arrangement for absorbing radiation, and lithography system
OwnerHerman BIEGinventor
Life of this patent
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Abstract
A mirror arrangement, such as for a lithography system, comprises: a plurality of mirror elements for reflecting radiation; a plurality of carrier elements, which each carry one of the mirror elements; and a mount arrangement having insert openings formed in each case to accommodate a respective one of the carrier elements, with the plurality of carrier elements, which each carry one of the mirror elements, being accommodated in the insert openings of the mount arrangement. For absorbing radiation, at least one of the insert openings does not accommodate a carrier element and/or, for absorbing radiation, at least one of the insert openings accommodates a dummy carrier element which does not carry a mirror element.
Claims21
A mirror arrangement, comprising:
- a plurality of MEMS mirror modules, each MEMS mirror module comprising a plurality of mirror elements configured to reflect radiation;
- a plurality of carrier elements, each carrier element carrying a respective mirror element;
- a mount arrangement comprising insert openings,
- wherein:
- each mirror element is accommodated in a respective insert opening;
- and
- to absorb radiation:
- i) an insert opening does not accommodate a carrier element;
- and/or ii) an insert opening accommodates a dummy carrier element which does not carry a mirror element.
Dependencies are inferred from the claim text.