Method for manufacturing an electrically conductive metal trace and corresponding metal trace, particularly suitable for transient electronic devices

A method for manufacturing an electrically conductive metal trace comprising

• a) depositing metal micro or nano particles in or on a substrate;
• b) removing an oxide layer;
• c) sintering the particles by photonic sintering and/or flash sintering and/or intense pulsed light sintering and/or laser sintering and/or UV sintering after oxide layer removal to form the electrically conductive metal trace;
• wherein
• said step b) removes the oxide layer around the particles;
• said step b) is an electrochemical process wherein the metal micro or nano particles are contacted by a reducing agent, and
• said step b) is carried out after said step a),
• wherein no photonic sintering or flash sintering or intense pulsed light sintering or laser sintering and/or UV sintering is carried out before said step b), wherein
• the metal micro or nano particles are isolated by their native oxide layer and said step b) of removing an oxide layer removes the native oxide layer from the metal micro or nano particles by depositing the reducing agent on the whole surface of the isolated micro or nano particles, wherein the reducing agent is applied by spraying.