Back to results
US 2025/0253129 A1Published application
Variable output impedance rf generator
AssigneeEagle Harbor Technologies, Inc.
InventorsJames Prager, Timothy Ziemba
Life of this patent
Estimating the term…
Loading patent…
Loading patent…
AssigneeEagle Harbor Technologies, Inc.
InventorsJames Prager, Timothy Ziemba
Estimating the term…
Various RF plasma systems are disclosed that do not require a matching network. In some embodiments, the RF plasma system includes an energy storage capacitor; a switching circuit coupled with the energy storage capacitor, the switching circuit producing a plurality of pulses with a pulse amplitude and a pulse frequency, the pulse amplitude being greater than 100 volts; a resonant circuit coupled with the switching circuit. In some embodiments, the resonant circuit includes: a transformer having a primary side and a secondary side; and at least one of a capacitor, an inductor, and a resistor. In some embodiments, the resonant circuit having a resonant frequency substantially equal to the pulse frequency, and the resonant circuit increases the pulse amplitude to a voltage greater than 2 kV.
A bias supply to apply a periodic voltage comprising:
The bias supply of claim 1, wherein the first current pathway is configured so the unidirectional current in the first pathway increases from zero current at a time t0 when the switch is closed to a peak value and then decreases back to zero at a time t1 when the switch is opened and a voltage between the output node and return node increases from a negative voltage at the time t0 to a peak value at the time t1.
The method of claim 9, wherein the connecting and disconnecting causes unidirectional current through a second current pathway between the second node and the third node.
An apparatus to apply a periodic voltage comprising:
The apparatus of claim 8, wherein the first current pathway comprises two inductive elements that are coupled together at the second node.
Dependencies are inferred from the claim text.