Composition for forming organic film, method for forming organic film, patterning process, and surfactant

A composition for forming an organic film, comprising:

• (A) a material for forming an organic film;
• (B) an aryl benzyl ether compound having a partial structure represented by the following general formula (B1);
• and
• (C) a solvent,
• wherein R1 represents a group represented by the following formula (B2-1) or either of groups containing fluorine represented by the following formulae (B2-2), relationships α+β=1, 0.1≤α≤0.5, and 0.5≤β≤0.9 are satisfied when, among structures constituting the R1, a proportion of groups represented by the following formula (B2-1) is “α” and a proportion of groups containing fluorine represented by the following formulae (B2-2) is “β”, R2 represents a saturated or unsaturated monovalent organic group having 1 to 30 carbon atoms, “a” represents 0 or 1, provided that when “a” is 0, “b” represents 1 to 5 and “c” represents 0 to 4, and when “a” is 1, “b” represents 1 to 7 and “c” represents 0 to 6, and “*” represents an attachment point to another atom,
• wherein a broken line represents an attachment point to the oxygen atom in the formula (B1), “n” represents 1 to 6, and one kind of the structure represented by the formula (B2-1) is contained or two kinds of the structure is contained,
• wherein a broken line represents an attachment point to the oxygen atom in the formula (B1), and one kind of the structures represented by the formulae (B2-2) is contained or two kinds of the structures are contained.