Semiconductor device processing composition, compound, method for producing modified substrate, and method for producing semiconductor device

Abstract

The present invention provides a composition for treating a semiconductor device, a compound, a method for producing a modified substrate, and a method for producing a semiconductor device, each of which can form a coating film having a high coat-forming property for inhibiting the formation of an ALD coating film. The composition for treating a semiconductor device of an embodiment of the present invention includes a compound having a specific functional group bonded to or adsorbed on a substrate and a polymerizable group, and a solvent, in which the specific functional group is a basic functional group or an acidic functional group, in a case where the specific functional group is the basic functional group, an acid dissociation constant of a conjugate acid of a compound obtained by adding a proton to the basic functional group is 7.0 or more, and in a case where the specific functional group is the acidic functional group, an acid dissociation constant of the compound upon dissociation of a proton from the acidic functional group is 5.0 or less.

Dependencies are inferred from the claim text.