Systems, devices, and methods for long repeat pattern embossing

An embossing system, comprising:

• a heating device positioned to expose a first surface of a substrate to thermal energy generated by a heat source;
• and
• a first embosser positioned to apply an embossing pattern to the first surface of the substrate after exposure to the thermal energy generated by the heat source, the first embosser having
• a turning roller rotationally engageable with a first portion of an inner surface of an embossing belt,
• a pressure roller rotationally engageable with a second portion of the inner surface of the embossing belt, the embossing belt forming a loop with the inner surface and an outer surface, wherein at least a portion of the outer surface includes a negative relief of the embossing pattern disposed thereon, and
• a support roller positioned to receive a second surface of the substrate that is opposite the first surface of the substrate while at least a portion of the negative relief is pressed at least partially into the first surface of the substrate.