Back to results
US 2025/0215232 A1Published application
Microparticles and method for producing microparticles
AssigneeNisshin Engineering Inc.
InventorsShu WATANABE, Shiori SUEYASU
Life of this patent
Estimating the term…
Abstract
Microparticles having excellent plasma resistance a method for producing the same are provided. The microparticles include SiC and Si and have a particle size of not more than 80 nm, a weight loss ratio of not more than 9 mass %, and a hydrophilicity degree of not more than 30%.
Claims3
Fine particles comprising SiC and Si,
- wherein the fine particles have a particle size of not more than 80 nm,
- a weight loss ratio of not more than 9 mass %, and
- a degree of hydrophilization of not more than 30%.
A method for producing fine particles, comprising:
- a step of supplying a feedstock into a thermal plasma flame, the feedstock being Si powder;
- and
- a step of supplying cooling gas to the thermal plasma flame to thereby produce the fine particles,
- wherein the cooling gas includes methane gas.
1 more element
Dependencies are inferred from the claim text.