Increasing Efficiency Of Photochemical Reactions On Substrates
AssigneeCentrillion Technologies, Inc.
InventorsGlenn McGall, Paul Dentinger, Darren Crandall, Bolan Li
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Abstract
Disclosed herein is a substrate which includes a functional group protected with a photolabile group covalently attached to the substrate and a film of solvent thereof covering the substrate, where the thickness of the film is less than about 100 μm. Also disclosed herein are methods of preparing such substrates. Further disclosed are methods of synthesizing polymers, methods of synthesizing arrays of polymers and methods of removing photolabile protecting groups. These methods all employ covering the substrate with a thin film of solvent where the thickness of the film is less than 100 μm.
Claims16
-8. (canceled)
A method for deprotecting a nucleic acid analog comprising:
- providing the nucleic acid analog protected with an ortho nitro benzyl protecting group which has a 3′ hydroxyl group covalently attached to a surface and a 5′ hydroxyl group protected with the ortho nitro benzyl protecting group;
- covering the surface and the covalently attached nucleic acid analog protected with the ortho nitro benzyl protecting group with a uniform layer of non-aqueous liquid solvent which has a height of less than 100 nanometers and a boiling point greater than 250° C.;
- and irradiating the surface.
A method for deprotecting a nucleic acid analog comprising:
- providing the nucleic acid analog protected with an ortho nitro benzyl protecting group which has a 5′ hydroxyl group covalently attached to a surface and a 3′ hydroxyl group protected with the ortho nitro benzyl protecting group;
- covering the surface and the covalently attached nucleic acid analog protected with the ortho nitro benzyl protecting group with a uniform layer of non-aqueous liquid solvent which has a height of less than 100 nanometers and a boiling point greater than 250° C.;
- and irradiating the surface.
Dependencies are inferred from the claim text.