Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic device

An actinic ray-sensitive or radiation-sensitive resin composition comprising a resin including a repeating unit represented by formula (1) below and a repeating unit represented by formula (2) below,

• wherein, in formula (1), X represents a halogen atom, a fluorinated alkyl group, or a fluorinated cycloalkyl group,
• Ra represents a hydrogen atom or a substituent,
• R1 represents a substituent, and R1 and Ra may be bonded to each other to form a ring, and
• in formula (2), A1 represents an optionally substituted alkyl group or cycloalkyl group,
• Rb represents a hydrogen atom or a substituent,
• Ar represents an aromatic hydrocarbon group or a metal complex group, and
• Ar and Rb may be bonded to each other to form a ring,
• provided that at least one of the repeating unit represented by formula (1) or the repeating unit represented by formula (2) has a group derived from at least one metal compound selected from the group consisting of a metal complex, an organometallic salt, an inorganic metal compound, and an organometallic compound.