Rf treatment systems and methods

An RF system, comprising:

• an RF chamber;
• a first electrode assembly;
• a second electrode assembly;
• an RF generator coupled to both the first electrode assembly and the second electrode assembly;
• a container with product positioned therein, wherein the container is positioned between the first electrode assembly and the second electrode assembly;
• one or more temperature sensing devices positioned in the container;
• and
• a controller, the controller including instructions stored in non-transitory memory to:
• determine one or more run parameters for an RF treatment, the one or more run parameters including a first target temperature for a product and a final target temperature for the product;
• apply RF power at a first power level until the first target temperature is reached, wherein the first target temperature is less than the final target temperature;
• responsive to reaching the first target temperature, vary application of the RF power via feedback control until desired treatment conditions are achieved.