Pulsed nano surfacing methods

A method to create a nano surface on a conductive device, the method comprising:

• cleaning the surface of the conductive device by at least one of ultrasound, plasma cleaning, light acid etching, electropolishing or ultraviolet light;
• creating on the conductive device a micro-scale and/or macroscale texture using at least one of acid etching, mechanical grinding, shot peening, conventional DC anodization, 3D printing or high polish passivation;
• placing the conductive device into an electrolyte solution, wherein the electrolytic solution is at least one of 0.1M to 1M NaF, 0.2% to 2% HCl, 0.1% HF, or 0.1M NaCl, or a combination of a sequential application of the same;
• and
• applying electric pulses and passivating the conductive device.

A system to fabricate a nano surface on a conductive device, the system comprising:

• a high voltage DC power source;
• a conductive device;
• a pulse generator, wherein the pulse generator is connected to the power source;
• a fluid container, wherein an electrolyte solution is placed within the fluid container;
• and
• a cathode and an anode, wherein the anode is coupled to the conductive device, and
• wherein the anode and cathode are coupled to the pulse generator and both are positioned within the fluid container with the device and wherein the pulse generator is configured to provide electric pulses to fabricate the nano surface.