Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
AssigneeKokusai Electric Corporation
InventorsYusuke TERUI, Yoshitomo HASHIMOTO, Tatsuru MATSUOKA, Tomoya NAGAHASHI
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Abstract
There is provided a technique that includes: forming a film containing a first element, a second element, carbon, and a halogen on a substrate by performing a cycle a predetermined number of times, the cycle including: (a) supplying a source containing the first element, carbon, and the halogen and not containing a chemical bond between carbon and hydrogen to the substrate; and (b) supplying a reactant containing the second element different from the first element to the substrate.
Claims20
A method of processing a substrate, comprising:
- forming a film containing a first element, a second element, carbon, and a halogen on the substrate by performing a cycle a predetermined number of times, the cycle including:
- (a) supplying a source containing the first element, carbon, and the halogen and not containing a chemical bond between carbon and hydrogen to the substrate;
- and
- (b) supplying a reactant containing the second element different from the first element to the substrate.
A substrate processing apparatus comprising:
- a source supply system configured to supply a source containing a first element, carbon, and a halogen and not containing a chemical bond between carbon and hydrogen to a substrate;
- a reactant supply system configured to supply a reactant containing a second element different from the first element to the substrate;
- and
- a controller configured to be capable of controlling the source supply system and the reactant supply system so as to form a film containing the first element, the second element, carbon, and the halogen on the substrate by performing a cycle a predetermined number of times, the cycle including:
- (a) supplying the source to the substrate;
- and (b) supplying the reactant to the substrate.
A non-transitory computer-readable recording medium storing a program that causes, by a computer, a substrate processing apparatus to perform a process comprising:
- forming a film containing a first element, a second element, carbon, and a halogen on a substrate by performing a cycle a predetermined number of times, the cycle including:
- (a) supplying a source containing the first element, carbon, and the halogen and not containing a chemical bond between carbon and hydrogen to the substrate;
- and
- (b) supplying a reactant containing the second element different from the first element to the substrate.
Dependencies are inferred from the claim text.