Shielding plasma etching data collection windows using positively charged conductive films

A chamber port assembly comprising:

• a chamber port defining a port opening;
• a transparent data collection window disposed in the port opening;
• and
• a window-protective film disposed on the transparent data collection window, the window-protective film comprising an electrically conductive transparent material configured to convey electromagnetic energy therethrough and to conduct electricity.

A method of preserving a data collection window included in a plasma etching system, the method comprising:

• forming an electrically conductive transparent window-protective film on surface of a data collection window;
• disposing the data collection window having the electrically conductive transparent window-protective film formed thereon in a chamber port of a plasma etching system;
• applying a voltage to the electrically conductive transparent window-protective film;
• generating an electric field from the window-protective film in response to the voltage;
• performing a plasma etching process in a reaction chamber of the plasma etching system;
• and
• repelling plasma ions produced during the plasma etching process away from the data collection window via the electric field.