System and method for enhanced rf power delivery using harmonic waveform synthesis

Abstract

The present disclosure provides a RF power delivery method for delivering the RF power to a plasma load in a microelectronic manufacturing environment. The RF power delivery method includes generating a harmonically distorted sinusoidal waveform. Such harmonically distorted sinusoidal waveform being derived from a predetermined harmonic signature corresponding to a desired plasma state. Next, the method includes amplifying the harmonically distorted sinusoidal waveform and capable of operating under conditions of high reflected power. Next, the method includes interfacing with a non-linear plasma load impedance. Thereafter, the method includes measuring the RF power spectrum at an output of the fixed impedance matching network, the measured spectrum being used to adjust the amplified harmonically distorted sinusoidal waveform to recreate a desired plasma state.

Dependencies are inferred from the claim text.