Filter material and manufacturing method thereof
AssigneeSangtech Lab Inc.
InventorsCheng-Sheng Liang, Pei-Chieh Chuang, Yong-Guei Chen, Jeng-Kuan Li, Hsin Huei Huang
Life of this patent
Estimating the term…
Abstract
Disclosed is a filter material used to remove cells and biomolecules. The filter material includes a polymer nonwoven fabric and a modifier. The modifier is fixed on the polymer nonwoven fabric. The critical wetting surface tension of the filter material is between 45 dynes/cm and 115 dynes/cm. The surface electrical property (Zeta potential) of the filter material is between −50 and +50 mV. There is no chemical solvent residue on the filter material. In addition, a manufacturing method of the above filter material is provided.
Claims11
A filter material used to remove cells and biomolecules, comprising:
- a polymer nonwoven fabric;
- and
- a modifier, fixed on the polymer nonwoven fabric,
- wherein a critical wetting surface tension of the filter material is between 45 dynes/cm and 115 dynes/cm, a surface electrical property (zeta potential) of the filter material is between-50 mV and +50 mV, and there is no chemical solvent residue on the filter material.
A manufacturing method of a filter material, wherein the filter material is used to remove cells and biomolecules, and the manufacturing method comprises:
- adding a polymer nonwoven fabric, a modifier, and carbon dioxide gas into a container;
- performing a heating reaction on the container and increasing a pressure of the container to obtain a supercritical carbon dioxide fluid;
- dissolving the modifier in the supercritical carbon dioxide fluid to fix the dissolved modifier on the polymer nonwoven fabric;
- and
- lowering a temperature and the pressure of the container after the heating reaction is over to recycle the supercritical carbon dioxide fluid and obtaining the filter material.
Dependencies are inferred from the claim text.