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US 2025/0185386 A1Published application
Infrared sensor and manufacturing method for the same
AssigneeToppan Inc.
InventorsAkiharu MIYANAGA, Tetsuji ITO
Life of this patent
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Abstract
An infrared sensor is provided, which includes a light absorption layer that absorbs an infrared ray. The light absorption layer includes quantum dots. The quantum dots include at least one kind of PbS, PbSe, CdHgTe, Ag2S, Ag2Se, Ag2Te, AgInSe2, AgInTe2, CuInSe2, CuInTe2, and InAs. Moreover, the light absorption layer includes a quantum dot layer divided into at least two regions, including the quantum dots and having mutually different absorption edge wavelengths, out of a wavelength region from a near-infrared region to a far-infrared region.
Claims6
An infrared sensor, comprising:
- a light absorption layer that absorbs an infrared ray, wherein the light absorption layer includes quantum dots, wherein the quantum dots include at least one kind of PbS, PbSe, CdHgTe, Ag2S, Ag2Se, Ag2Te, AgInSe2, AgInTe2, CuInSe2, CuInTe2, and InAs, and wherein the light absorption layer includes a quantum dot layer divided into at least two regions, including the quantum dots and having mutually different absorption edge wavelengths, out of a wavelength region from a near-infrared region to a far-infrared region.
Dependencies are inferred from the claim text.