Substrate processing apparatus, fluid supply system, and substrate processing method

A fluid supply system comprising:

• a supply flow path configured to supply a processing fluid into a processing chamber;
• a heating mechanism configured to heat the processing fluid flowing through the supply flow path;
• a first temperature sensor configured to detect a temperature of the processing fluid downstream of the heating mechanism;
• a pressure sensor configured to detect a pressure of the processing fluid downstream of the heating mechanism;
• and
• a controller;
• wherein the controller controls an output of the heating mechanism based on the pressure of the processing fluid detected by the pressure sensor and the temperature of the processing fluid detected by the first temperature sensor.

A substrate processing method using a substrate processing apparatus including:

• a processing chamber configured to accommodate a substrate;
• a supply flow path configured to supply a processing fluid into the processing chamber;
• a heating mechanism configured to heat the processing fluid flowing through the supply flow path;
• a first temperature sensor configured to detect a temperature of the processing fluid downstream of the heating mechanism;
• and
• a pressure sensor configured to detect a pressure of the processing fluid downstream of the heating mechanism, the substrate processing method comprising controlling an output of the heating mechanism based on the pressure of the processing fluid detected by the pressure sensor and the temperature of the processing fluid detected by the first temperature sensor.