Tantalum sputtering target with improved performance and predictability and method of manufacturing

A method of making a tantalum sputtering target comprising the steps of:

• providing a tantalum ingot, said ingot having a generally cylindrical configuration with a central longitudinal axis;
• sectioning said tantalum ingot by cutting said tantalum ingot transverse to said central longitudinal axis to form at least a billet slice;
• wherein said billet slice is generally cylindrical and shorter than said tantalum ingot, when measured along said central longitudinal axis of said tantalum ingot and a central longitudinal axis of said billet slice;
• thermo-mechanically processing said billet slice to form a tantalum target blank, wherein said thermo-mechanically processing is comprised of upset forging reduction and varying rolling reduction;
• said upset forging reduction results in a thickness reduction between about 15%-35% of said billet slice and said varying rolling reduction results in a thickness reduction of said billet slice varying between about 5%-15% per pass.