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AssigneesKabushiki Kaisha Toshiba, Toshiba Energy Systems & Solutions Corporation
InventorsNaomi SHIDA, Katsuyuki NAITO, Toshiro HIRAOKA, Tomohiro TOBARI
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According to an embodiment, there are provided a coating device and a coating method for forming a coating film by a meniscus method, the coating device and the coating method being capable of forming a uniform coating film. The coating device includes: a coating bar; a base material conveyance member that conveys a base material; a plurality of nozzles that supply the coating liquid to a surface of the coating bar; and a coating liquid supply member that supplies the coating liquid to the nozzles, in which a coating liquid supply amount adjustment member that adjusts a supply amount of the coating liquid to be supplied to the nozzles is provided at a position upstream of each of the nozzles.
A coating device for supplying a coating liquid to a surface of a base material to form a coating film by a meniscus method, said coating device comprising:
A coating method for forming a meniscus of a coating liquid between a coating bar and a base material, conveying said base material, and applying said coating liquid to a surface of said base material, said coating method comprising:
Dependencies are inferred from the claim text.