Methods of forming nanostructures utilizing self-assembled nucleic acids
AssigneeMicron Technology, Inc.
InventorGurtej S. Sandhu
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Abstract
A method of forming a nanostructure comprises forming an initial pattern of self-assembled nucleic acids on a substrate. The initial pattern of self-assembled nucleic acid exhibits at least one defect. The initial pattern of self-assembled nucleic acids is contacted with at least one enzyme to repair the at least one defect and form a reduced defect pattern of self-assembled nucleic acids. The method also includes transferring the reduced defect pattern of self-assembled nucleic acids to the substrate to form a patterned substrate. At least one dimension of the pattern on the patterned substrate is less than about 50 nanometers (nm). Additional methods are also disclosed.
Claims20
A method of forming a nanostructure, comprising:
- forming an initial pattern of self-assembled nucleic acids on a substrate, the initial pattern of self-assembled nucleic acid exhibiting at least one defect;
- contacting the initial pattern of self-assembled nucleic acids with at least one enzyme to repair the at least one defect and produce a reduced defect pattern of self-assembled nucleic acids;
- and
- transferring the reduced defect pattern of self-assembled nucleic acids to the substrate to form a patterned substrate, wherein at least one dimension of a pattern on the patterned substrate is less than about 50 nanometers (nm).
A method of forming a nanostructure, comprising:
- forming an initial mask on a substrate, the initial mask comprising self-assembled nucleic acids exhibiting an initial defect density;
- contacting the initial mask with at least one repair enzyme and forming a repaired mask comprising repaired self-assembled nucleic acids exhibiting a lower defect density than the initial defect density, the repaired mask including at least one opening extending therethrough;
- removing portions of the substrate exposed through the at least one opening of the repaired mask to form a modified substrate including at least one trench therein;
- and
- forming one or more devices within the at least one trench of the modified substrate.
A method of forming a nanostructure, comprising:
- forming a hardmask material over a substrate;
- forming an initial pattern of self-assembled nucleic acids on a hardmask;
- contacting the initial pattern of self-assembled nucleic acids with at least one repair enzyme to reduce a defect density within the initial pattern of self-assembled nucleic acids and form a repaired pattern of self-assembled nucleic acids on the hardmask and the substrate;
- removing portions of the hardmask and portions of the substrate exposed through the repaired pattern of self-assembled nucleic acids;
- and
- removing the repaired pattern of self-assembled nucleic acids and the remaining portions of the hardmask to provide a modified substrate comprising one or more features.
Dependencies are inferred from the claim text.