System and method for performing 3d photoresist profile generation
AssigneeCoventor, Inc.
InventorsQing Peng Wang, Rui Bao, Cheng Li, Yu De Chen, Shi-hao Huang, Joseph Ervin
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Abstract
Systems and methods for performing 3D photoresist profile generation for a semiconductor device fabrication environment are discussed. The methods comprise receiving in a virtual fabrication environment a top contour mask and a bottom contour mask, creating a loading map using a subset of density information extracted from the top contour mask and the bottom contour mask, performing an etch operation using the loading map to generate the 3D photoresist profile, and outputting a result of the etch operation.
Claims20
A non-transitory medium holding computing device-executable instructions for performing 3D photoresist profile generation, the instructions when executed causing at least one computing device equipped with at least one processor to:
- receive in a virtual fabrication environment a top contour mask that describes a photoresist profile at a top of a semiconductor device structure being fabricated and a bottom contour mask that describes a photoresist profile at a bottom of a semiconductor device structure being fabricated;
- creating a loading map using a subset of density information extracted from the top contour mask and the bottom contour mask;
- perform an etch operation using the loading map to generate a 3D photoresist profile for the semiconductor device structure;
- and
- output a result of the etch operation.
A computing device-implemented method for performing 3D photoresist profile generation, the method comprising:
- receiving in a virtual fabrication environment a top contour mask that describes a photoresist profile at a top of a semiconductor device structure being fabricated and a bottom contour mask that describes a photoresist profile at a bottom of a semiconductor device structure being fabricated;
- creating a loading map using a subset of density information extracted from the top contour mask and the bottom contour mask;
- performing an etch operation using the loading map to generate a 3D photoresist profile for the semiconductor device structure being fabricated;
- and
- output a result of the etch operation.
A system for performing 3D photoresist profile generation, comprising:
- at least one computing device equipped with one or more processors that is configured to generate a virtual fabrication environment that includes a 3D photoresist profile generation module, the 3D photoresist profile generation module when executing:
- receiving in a virtual fabrication environment a top contour mask that describes a photoresist profile at a top of a semiconductor device structure being fabricated and a bottom contour mask that describes a photoresist profile at a bottom of a semiconductor device structure being fabricated,
- creating a loading map using a subset of density information extracted from the top contour mask and the bottom contour mask, and
- performing an etch operation using the loading map to generate a 3D photoresist profile for the semiconductor device structure being fabricated;
- and
- a display surface communicatively coupled to the at least one computing device and configured to display a result of the etch operation.
Dependencies are inferred from the claim text.