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US 2025/0164410 A1Published application
Optical metrology
AssigneeTokyo Electron Limited
InventorsHolger Tuitje, Xinkang Tian, Ching Ling Meng
Life of this patent
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Abstract
A method for monitoring a plurality of process chambers, the method includes generating an optical beam at a light source. The method further includes dividing the optical beam into a plurality of light beams. The method further includes providing the plurality of light beams to the plurality of process chambers. And the method further includes measuring the plurality of light beams after being reflected within the plurality of process chambers.
Claims22
A method for monitoring a plurality of process chambers, the method comprising:
- generating an optical beam at a light source;
- dividing the optical beam into a plurality of light beams;
- providing the plurality of light beams to the plurality of process chambers;
- and
- measuring the plurality of light beams after being reflected within the plurality of process chambers.
2 more elements
A method comprising:
- dividing an optical beam into a plurality of light beams;
- transmitting the plurality of light beams through a plurality of light adjustment systems in to a plurality of process chambers;
- reflecting one of the plurality of light beams off each of a plurality of calibration wafers to measure a property of each of the plurality of calibration wafers, each of the plurality of calibration wafers having a known surface reflectance;
- determining, in a controller, whether the property of each of the plurality of calibration wafers is within a process window;
- and
- adjusting one or more of the plurality of light adjustment systems based on the determining.
3 more elements
An optical metrology system comprising:
- a light divider optically coupled to a light source, the light divider having a single optical input and a plurality of optical outputs;
- illumination systems optically coupled to the light divider, each of the illumination systems optically coupled to one of the optical outputs and each of the illumination systems being associated with one of a plurality of process chambers;
- and
- collection systems, each of the collection systems being associated with one of the plurality of process chambers, each of the collection systems being optically coupled to one of the illumination systems through the associated process chamber.
1 more element
Dependencies are inferred from the claim text.