Coating film forming method, coating film forming apparatus, and storage medium

A non-transitory computer-readable storage medium storing a program that is used in a liquid processing apparatus including a rotation mechanism configured to rotate a substrate, a coating liquid supply part configured to supply a coating liquid to a central portion of a front surface of the substrate, and a gas nozzle configured to supply a high-temperature gas to a rear surface of the substrate, and, when executed by a computer, causes the liquid processing apparatus to execute:

• a coating step of supplying the coating liquid to the central portion of the front surface of the substrate and rotating the substrate to spread the coating liquid to a peripheral edge portion of the substrate so as to form a coating film;
• a high-temperature gas supply step of supplying the high-temperature gas having a temperature higher than a temperature of the substrate supplied with the coating liquid to a portion of an exposed region of the rear surface of the rotating substrate;
• a film thickness distribution adjustment step of adjusting film thickness distribution of the coating film in a plane of the substrate by rotating the substrate at a first rotation speed;
• and
• a drying step of drying the substrate by rotating the substrate at a second rotation speed different from the first rotation speed such that a film thickness of the coating film is changed in an entire plane of the substrate after the film thickness distribution adjustment step,
• wherein a period during which the drying step is executed includes a period during which the supplying of the high-temperature gas to the substrate is stopped.