# US 2025/0159971 A1 · FINFET Gate Structure and Related Methods

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- Number: US 2025/0159971 A1
- Document ID: US20250159971A1
- Status: Published application
- Kind: A1
- Application number: 19/027,595
- Filed: 2025-01-17
- Published: 2025-05-15
- Earliest claimed: 2018-10-31
- Assignees: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicants: Taiwan Semiconductor Manufacturing Co., Ltd.
- Inventors: Cheng-Ting Chung; Ching-Wei Tsai; Kuan-Lun Cheng
- Web page: https://patentgrep.com/patent/US20250159971A1

## CPC

- H10D 84/038: {using silicon technology, e.g. SiGe}
- H10D 30/024: {of fin field-effect transistors [FinFET]}
- H10D 64/017: {using dummy gates in processes wherein at least parts of the final gates are self-aligned to the dummy gates, i.e. replacement gate processes}
- H10D 64/021: {using multiple gate spacer layers, e.g. bilayered sidewall spacers}
- H10D 64/685: {being perpendicular to the channel plane}
- H10D 64/691: {comprising metallic compounds, e.g. metal oxides or metal silicates (insulators comprising nitrogen H10D64/693)}
- H10D 84/013: {Manufacturing their source or drain regions, e.g. silicided source or drain regions}
- H10D 84/0135: {Manufacturing their gate conductors}
- H10D 84/014: {the gate conductors having different materials or different implants}
- H10D 84/0151: {Manufacturing their isolation regions}
- H10D 84/0158: {the components including FinFETs}
- H10D 84/834: {comprising FinFETs}
- H10D 84/8316: {the IGFETs characterised by having gate sidewall spacers specially adapted for integration}
- H10D: INORGANIC ELECTRIC SEMICONDUCTOR DEVICES

## Abstract

A semiconductor device includes a substrate having a fin element extending therefrom. In some embodiments, a gate structure is formed over the fin element, where the gate structure includes a dielectric layer on the fin element, a metal capping layer disposed over the dielectric layer, and a metal electrode formed over the metal capping layer. In some cases, first sidewall spacers are formed on opposing sidewalls of the metal capping layer and the metal electrode. In various embodiments, the dielectric layer extends laterally underneath the first sidewall spacers to form a dielectric footing region.

## Claims

### Claim 1

A semiconductor device, comprising:
a gate structure formed over a fin element, wherein the gate structure includes a dielectric layer over the fin element, a capping layer disposed over the dielectric layer, and a gate electrode formed over the capping layer; and
a first spacer formed on sidewalls of the capping layer and the gate electrode;
wherein the dielectric layer includes a high-K dielectric layer that extends laterally underneath the first spacer to form a dielectric footing region; and
wherein the dielectric footing region provides a capacitive coupling between the gate electrode and a channel region within the fin element, and wherein the capacitive coupling is proportional to a thickness of the first spacer.

### Claim 2 (depends on 1)

The semiconductor device of claim 1, wherein the dielectric layer further includes an interfacial layer formed on the fin element and the high-K dielectric layer formed over the interfacial layer, and wherein the interfacial layer and the high-K dielectric layer extend laterally underneath the first spacer to form the dielectric footing region.

### Claim 3 (depends on 1)

The semiconductor device of claim 1, wherein a length of the dielectric footing region is substantially equal to the thickness of the first spacer.

### Claim 4 (depends on 1)

The semiconductor device of claim 1, further comprising:
a second spacer formed on sidewalls of the first spacer and the dielectric layer.

### Claim 5 (depends on 1)

The semiconductor device of claim 1, wherein first spacer includes SiN, SiOC, or a low-K material, wherein the capping layer includes TiN or TSN, and wherein the dielectric layer includes HfO2 or HfZrO.

### Claim 6 (depends on 1)

The semiconductor device of claim 1, further comprising:
source/drain features disposed over portions of the fin element within source/drain regions adjacent to the gate structure.

### Claim 7 (depends on 1)

The semiconductor device of claim 1, wherein a portion of the dielectric layer that forms the dielectric footing region is in contact with a bottom surface of the first spacer.

### Claim 8 (depends on 4)

The semiconductor device of claim 4, wherein the first and second spacers are composed of a same material.

### Claim 9 (depends on 1)

The semiconductor device of claim 1, wherein the capping layer includes a nitrogen-containing capping layer.

### Claim 10

A device, comprising:
first and second fins extending from a substrate;
a gate structure disposed over and extending between the first and second fins, wherein the gate structure includes an interfacial layer, a high-K dielectric layer over the interfacial layer, and an electrode layer over the high-K dielectric layer, and wherein a sidewall spacer is disposed along a sidewall of the electrode layer;
wherein the interfacial layer and the high-K dielectric layer extend laterally underneath the sidewall spacer to provide a first high-K footing region over a first channel region of the first fin and a second high-K footing region over a second channel region of the second fin.

### Claim 11 (depends on 10)

The device of claim 10, wherein a first length of the first high-K footing region and a second length of the second high-K footing region are substantially equal to a thickness of the sidewall spacer.

### Claim 12 (depends on 10)

The device of claim 10, wherein a first capacitive coupling between the electrode and the first channel region is the same as a second capacitive coupling between the electrode and the second channel region.

### Claim 13 (depends on 10)

The device of claim 10, wherein a first capacitive coupling between the electrode and the first channel region and a second capacitive coupling between the electrode and the second channel region are proportional to a thickness of the sidewall spacer.

### Claim 14 (depends on 10)

The device of claim 10, wherein the high-K dielectric layer of the first high-K footing region contacts a bottom surface of the sidewall spacer in a first region of the sidewall spacer.

### Claim 15 (depends on 14)

The device of claim 14, wherein the high-K dielectric layer of the second high-K footing region contacts the bottom surface of the sidewall spacer in a second region of the sidewall spacer.

### Claim 16 (depends on 10)

The device of claim 10, wherein the gate structure further includes a capping layer interposing the high-K dielectric layer and the electrode layer, and wherein the sidewall spacer is further disposed along a sidewall of the capping layer.

### Claim 17 (depends on 16)

The device of claim 16, wherein the capping layer includes a nitrogen-containing capping layer.

### Claim 18 (depends on 10)

The device of claim 10, further comprising:
a merged source/drain feature disposed over and extending between source/drain regions of the first and second fins.

### Claim 19

A semiconductor device, comprising:
a gate stack disposed over a fin element; and
sidewall spacers disposed on opposing sidewalls of the gate stack;
wherein the gate stack includes an interfacial layer, a high-K dielectric layer over the interfacial layer, and a nitrogen-containing capping layer over the high-K dielectric layer; and
wherein the sidewall spacers are disposed over lateral ends of the interfacial layer and the high-K dielectric layer, a bottom surface of the sidewall spacers contacting a top surface of the lateral end of the high-K dielectric layer, and a lateral surface of the sidewall spacers contacting a side surface of the nitrogen-containing capping layer.

### Claim 20 (depends on 19)

The semiconductor device of claim 19, wherein the lateral ends of the interfacial layer and the high-K dielectric layer define a dielectric footing region that provides a capacitive coupling between an electrode of the gate stack and a channel region of the fin element, and wherein the capacitive coupling is proportional to a thickness of the sidewall spacers.