Plasma processing apparatus
AssigneeDAIHEN Corporation
InventorsRyoji TAMAKI, Shinichi HASEGAWA
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Abstract
A plasma processing apparatus includes: an inner electrode; an electrode holder; an outer electrode formed in a cylindrical shape, the outer electrode surrounding the inner electrode and the electrode holder; an insulating pipe disposed between the inner electrode and the outer electrode and between the electrode holder and the outer electrode, the insulating pipe surrounding the inner electrode and the electrode holder; a rotary cylindrical portion made of an insulating material and formed in a cylindrical shape surrounding the outer electrode, the rotary cylindrical portion being rotatable relative to the outer electrode about a central axis of the inner electrode; and a drive mechanism that rotates the rotary cylindrical portion.
Claims6
A plasma processing apparatus comprising:
- an inner electrode that receives application of a voltage;
- an electrode holder that holds the inner electrode;
- an outer electrode formed in a cylindrical shape, the outer electrode surrounding the inner electrode and the electrode holder;
- an insulating pipe disposed between the inner electrode and the outer electrode and between the electrode holder and the outer electrode, the insulating pipe surrounding the inner electrode and the electrode holder;
- a rotary cylindrical portion made of an insulating material and formed in a cylindrical shape surrounding the outer electrode, the rotary cylindrical portion being rotatable relative to the outer electrode about a central axis of the inner electrode;
- and
- a drive mechanism that rotates the rotary cylindrical portion.
Dependencies are inferred from the claim text.