Charged Particle Beam Apparatus
AssigneeHitachi, Ltd.
InventorsFumiaki ICHIHASHI, Toshiaki TANIGAKI
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Abstract
A charged particle beam apparatus includes: an electron source that irradiates a membrane-type holder with an electron beam; a deflector that changes an angle of incidence of the electron beam; a camera that is exposed to the electron beam transmitted through the membrane-type holder; and a control unit that controls the electron source, the deflector, and the camera. The control unit obtains an exposure image by continuously exposing the camera to the electron beam while changing the angle of incidence of the electron beam focused on any one of a first layer, a second layer, and a third layer included in the membrane-type holder.
Claims9
A charged particle beam apparatus comprising:
- an electron source that irradiates a membrane-type holder with an electron beam;
- a deflector that changes an angle of incidence of the electron beam;
- a camera that is exposed to the electron beam transmitted through the membrane-type holder;
- and
- a control unit that controls the electron source, the deflector, and the camera,
- wherein the control unit obtains an exposure image by continuously exposing the camera to the electron beam while changing the angle of incidence of the electron beam focused on any one of a first layer, a second layer, and a third layer included in the membrane-type holder.
Dependencies are inferred from the claim text.