Generate 3d photoresist profiles using digital lithography
AssigneeApplied Materials, Inc.
InventorsChi-Ming TSAI, Thomas L. LAIDIG
Life of this patent
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Abstract
Embodiments described herein provide for a system, a software application, and a method of a lithography process to form a three-dimensional profile in a single exposure operation. An image projections system of a lithography system will provide a plurality of shots to a photoresist layer. To form a three-dimensional profile in the photoresist layer, a local shot density of a plurality of shots within an exposure area will be varied. The local shot density will determine a dose provided by the image projection system at each sub-grid of an exposure area. The dose will determine the thickness of a photoresist layer when the plurality of shots are projected to the photoresist layer.
Claims20
A system, comprising:
- a slab;
- a moveable stage disposable over the slab, the moveable stage configured to support a substrate having a photoresist layer disposed thereon;
- a controller configured to provide mask pattern data to a lithography system, the mask pattern data having an exposure area with a gray pattern, wherein the gray pattern is defined by a plurality of sub-grids, each sub-grid including a pattern area defined therein;
- and
- a lithography system support coupled to the slab having an opening to allow the moveable stage to pass thereunder, wherein:
- the lithography system has a processing unit with a plurality of image projection systems that receive the mask pattern data;
- each image projection system comprising a spatial light modulator with a plurality of spatial light modulator pixels to project a plurality of shots;
- the controller is configured to position a plurality of pattern areas within each of the sub-grids to vary a local shot density at each sub-grid;
- and
- the controller is configured to instruct each of the spatial light modulators to project the plurality of shots to the plurality of pattern areas in each sub-grid of the gray pattern.
A non-transitory computer-readable medium storing instructions that, when executed by a processor, cause a computer system to perform the steps of:
- providing a mask pattern data having a plurality of exposure areas to a processing unit of a lithography system, the processing unit having a plurality of image projection systems that receive the mask pattern data, wherein each exposure area includes a gray pattern, the gray pattern comprising:
- a plurality of sub-grids;
- and
- a plurality of pattern areas in each sub-grid, the plurality of pattern areas corresponding to a local shot density of each sub-grid;
- and
- in a single scan of a substrate having a photoresist layer disposed thereon under the plurality of image projection systems:
- projecting a plurality of shots to the plurality of pattern areas of the gray pattern to the photoresist layer;
- and
- developing the photoresist layer to form a three-dimensional profile in the photoresist layer, the three-dimensional profile defined by the local shot density at each sub-grid of each exposure area.
A method, comprising:
- providing a mask pattern data having a plurality of exposure areas to a processing unit of a lithography system, the processing unit having a plurality of image projection systems that receive the mask pattern data, wherein each exposure area includes a gray pattern, the gray pattern comprising:
- a plurality of sub-grids;
- and
- a plurality of pattern areas in each sub-grid, the plurality of pattern areas corresponding to a local shot density of each sub-grid;
- and
- in a single scan of a substrate having a photoresist layer disposed thereon under the plurality of image projection systems:
- projecting a plurality of shots to the plurality of pattern areas of the gray pattern to the photoresist layer;
- and
- developing the photoresist layer to form a three-dimensional profile in the photoresist layer, the three-dimensional profile defined by the local shot density at each sub-grid of each exposure area.
Dependencies are inferred from the claim text.