Set comprising a physical vapor deposition machine and an obstruction device, method for coating and obstruction device
AssigneeEssilor International
InventorsFrancis HENKY, Mark MILDEBRATH
Life of this patent
Estimating the term…
Abstract
Set comprising a physical vapor deposition machine and an obstruction device. The physical vapor deposition machine comprises a vacuum container, an ion beam gun and a support member. The support member comprises at least one hole, the at least one hole is intended to receive a substrate, a shape of the substrate has sensibly a shape of the at least one hole. The ion beam gun is configured to generate an ion beam toward the support member. The obstruction device is configured to obstruct a gap between the at least one hole and the substrate when the substrate is placed in the at least one hole and the obstruction device is placed on the substrate.
Claims14
Set comprising a physical vapor deposition machine (10) and an obstruction device (33),
- the physical vapor deposition machine (10) comprising
- a vacuum container (12),
- an ion beam gun (19) and
- a support member (16)
- the support member (16) comprising at least one hole, the at least one hole being intended to receive a substrate (17), a shape of the substrate (17) having sensibly a shape of the at least one hole,
- the ion beam gun (19) being configured to generate an ion beam toward the support member (16),
- the obstruction device (33) being configured to obstruct a gap (32) between the at least one hole and the substrate when the substrate (17) is placed in the at least one hole and the obstruction device (33) is placed on the substrate (17)
- the obstruction device (33) comprising a casing forming an enclosed chamber,
- the casing being made of a soft and deformable material,
- the enclosed chamber being filled with hard elements.
Method for coating a substrate (17),
- the method comprising:
- a step (601) of placing the substrate (17) in a hole of a support member (16) of a physical vapor deposition machine (10),
- a step (602) of placing an obstruction device (33) on the substrate (17) to obstruct a gap between the hole and the substrate (33) and
- a step (603) of generating an ion beam from an ion beam gun (19) located under the support member (16).
Obstruction device (33) configured to be used in a physical vapor deposition machine (10),
- the physical vapor deposition machine (10) comprising
- a vacuum container (12),
- an ion beam gun (19) and
- a support member (16),
- the support member (16) comprising at least one hole, the at least one hole being intended to receive a substrate, a shape of the substrate (33) having sensibly a shape of the at least one hole,
- the ion beam gun (19) being configured to generate an ion beam toward the support member (16),
- the obstruction device (33) being configured to obstruct a gap (32) between the at least one hole and the substrate (17) when the substrate is placed in the at least one hole and the obstruction device (33) is placed on the substrate (17)
- the obstruction device (33) comprising a casing forming an enclosed chamber,
- the casing being made of a soft and deformable material,
- the enclosed chamber being filled with hard elements.
Dependencies are inferred from the claim text.