# US 2025/0154031 A1 · Systems and Methods for Water Purification

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- Number: US 2025/0154031 A1
- Document ID: US20250154031A1
- Status: Published application
- Kind: A1
- Application number: 18/947,985
- Filed: 2024-11-14
- Published: 2025-05-15
- Earliest claimed: 2023-11-14
- Assignees: Board of Regents, The University of Texas System
- Applicants: Board of Regents, the University of Texas System
- Inventors: Donglei FAN; Xianfu LUO; Weigu LI; Yifei LIU; Huifeng LI
- Web page: https://patentgrep.com/patent/US20250154031A1

## CPC

- C02F 1/48: with magnetic or electric fields (C02F1/46 takes precedence)
- C23C 16/01: on temporary substrates, e.g. substrates subsequently removed by etching
- C23C 16/26: Deposition of carbon only
- C25D 5/04: Electroplating with moving electrodes
- C25D 5/50: by heat-treatment
- C25D 5/623: {Porosity of the layers}
- C02F 2201/48: Devices for applying magnetic or electric fields
- C02F 2303/04: Disinfection
- C02F: TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE (separation in general B01D; special arrangements on waterborne vessels of installations for treating water, waste water or sewage, e.g. for producing fresh water, B63J; adding materials to water to prevent corrosion C23F; treating radioactively-contaminated liquids G21F9/04; regeneration of reactants for recirculation into processes, see the relevant places for the processes)
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- C25D: PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR

## Abstract

Disclosed are methods and systems for water purification.

## Claims

### Claim 1

A method for removing bacteria from a water sample, the method comprising
introducing water comprising a population of bacteria into a purification chamber, wherein the purification chamber comprises a plurality of electrodes;
generating an AC electric field within the purification chamber for a period of time effective to induce migration and capture of at least a portion of the bacteria on the plurality of electrodes; and
removing the water from the purification chamber;
wherein each of the plurality of electrodes comprises a porous dendritic graphite foam.

### Claim 2 (depends on 1)

The method of claim 1, wherein the plurality of electrodes are arranged in a substantially parallel orientation.

### Claim 3 (depends on 2)

The method of claim 2, wherein the plurality of electrodes are separated by an inter-electrode distance of from 25 microns to 1000 microns.

### Claim 4 (depends on 1)

The method of claim 1, wherein the plurality of electrodes comprise from four to one hundred electrodes.

### Claim 5 (depends on 1)

The method of claim 1, wherein the generating an AC electric field comprises applying a voltage of from greater than 0 V to 20 V.

### Claim 6 (depends on 1)

The method of claim 1, AC electric field has a frequency of from 1 Hz to 80 MHz.

### Claim 7 (depends on 1)

The method of claim 1, wherein generating an AC electric field comprises generating the AC electric field for from 5 minutes to 30 minutes.

### Claim 8 (depends on 1)

The method of claim 1, wherein the porous dendritic graphite foams comprise porous graphite struts deposed on a surface of a core.

### Claim 9 (depends on 8)

The method of claim 8, wherein the struts comprise porous dendrites.

### Claim 10 (depends on 1)

The method of claim 1, wherein the porous dendritic graphite foams have a thickness of at least 100 μm.

### Claim 11 (depends on 1)

The method of claim 1, wherein the porous dendritic graphite foams have an average pore size from 1-10,000 nm.

### Claim 12 (depends on 1)

The method of claim 1, wherein the porous dendritic graphite foams have a BET surface area of at least 5.0 m2/g.

### Claim 13 (depends on 1)

The method of claim 1, wherein the porous dendritic graphite foams have an areal density of at least 0.01 mg/cm2.

### Claim 14 (depends on 1)

The method of claim 1, wherein the porous dendritic graphite foams have a volumetric surface area of at least 0.01 m2/cm3.

### Claim 15 (depends on 1)

The method of claim 1, wherein the porous dendritic graphite foams are made by a method that comprises:
(a) placing a conductive substrate in an electrolyte solution, wherein the electrolyte solution is in electrical communication with an electrode;
(b) applying an electric current via the electrode sufficient to grow metal dendrites on the surface of the conductive substrate;
(c) annealing the metal dendrites and conductive substrate;
(d) depositing carbon upon the annealed metal dendrites and the conductive substrate; and
(e) removing the annealed metal dendrites and conductive substrate to obtain a three-dimensional graphite foam comprising porous graphite dendrites radiating from a porous core.

### Claim 16 (depends on 15)

The method of claim 15, wherein the electric current is applied to the conductive substrate from 25-500 C/in2, relative to the surface area of the conductive substrate.

### Claim 17 (depends on 15)

The method of claim 15, wherein step (b) comprises:
(b1) applying an electric current via the electrode sufficient to grow metal dendrites on the surface of the conductive substrate;
(b2) rotating the metal substrate relative to the electrode; and
(b3) applying an electric current via the electrode sufficient to grow metal dendrites on the surface of the rotated conductive substrate.

### Claim 18 (depends on 17)

The method of claim 17, wherein the depositing step comprises chemical vapor deposition or hydrothermal synthesis using a carbon source, or thermal annealing of a carbon source coated on the surface.

### Claim 19 (depends on 18)

The method of claim 18, wherein the carbon source comprises a C2-4 hydrocarbon or a carbon-backboned polymer.

### Claim 20 (depends on 15)

The method of claim 15, wherein the conductive substrate is removed by chemical etching.
