Photosensitive resin composition, method for producing resist pattern film, and method for producing plated shaped article

2:

• The photosensitive resin composition according to claim 1, wherein the photoacid generator (B) comprises a compound represented by formula (B1):
• wherein, in the formula (B1), R11 is a hydrogen atom, a fluorine atom, a hydroxy group, an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or an alkoxycarbonyl group having 2 to 11 carbon atoms, R12 is an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, an alkanesulfonyl group or an arylthio group having 1 to 10 carbon atoms, R13 and R14 are each independently an unsubstituted or substituted alkyl group having 1 to 10 carbon atoms, an unsubstituted or substituted phenyl group or naphthyl group, or R13 and R14 are bonded to each other to form a divalent group having 2 to 10 carbon atoms, k is an integer of 0 to 2, r is an integer of 0 to 10, X− is PF6−, BF4−, (CF3CF2)3PF3−, (C6F5)4B−, ((CF3)2C6H3)4B−, or an anion represented by any of formulae (b-1) to (b-4):
• R15CpHqFrSO3−:
• (b-1)
• R15SO3−:
• (b-2)
• wherein, in formulae (b-1) and (b-2), R15 is a hydrogen atom, a fluorine atom, or a substituted or unsubstituted hydrocarbon group having 1 to 12 carbon atoms, p is an integer of 1 to 10, q and r are integers satisfying 2p=q+r, and r≠0,
• wherein, in formula (b-3), R16 and R17 are each independently a fluorine-substituted alkyl group having 1 to 10 carbon atoms, or R16 and R17 are bonded to each other to form a divalent fluorine-substituted alkylene group having 2 to 10 carbon atoms, and
• wherein, in formula (b-4), R18, R19, and R20 are each independently a fluorine-substituted alkyl group having 1 to 10 carbon atoms, and optionally two of R18, R19, and R20 are bonded to each other to form a divalent fluorine-substituted alkylene group having 2 to 10 carbon atoms.

7:

• A method for producing a resist pattern film, the method comprising:
• applying the photosensitive resin composition according to claim 1 onto a substrate to form a resin coating film;
• exposing the resin coating film to light;
• and
• developing the resin coating film after exposure to form a resist pattern.

11:

• A method for producing a plated shaped article, the method comprising:
• producing a resist pattern film by the method according to claim 7;
• and
• performing a plating treatment on the substrate using the resist pattern film as a mask to obtain the plated shaped article.