Back to results
US 2025/0145448 A1Published application
Anti-stiction layer deposition
OwnerMichael Grimes, Yuyuan Lininventors
Life of this patent
Estimating the term…
Abstract
An anti-stiction layer is formed from a first organosilane precursor. A second organosilane precursor is introduced around the workpiece with the anti-stiction layer. The second organosilane precursor is different from the first organosilane precursor. The second organosilane precursor is configured to eliminate defect sites and unreacted sites on the anti-stiction layer and on a surface of the workpiece that includes the anti-stiction layer.
Claims20
A method of deposition comprising:
- depositing a first layer on a workpiece, wherein the first layer is formed from a first organosilane precursor, and wherein the first layer is an anti-stiction layer;
- and
- introducing a second organosilane precursor around the workpiece with the first layer, wherein the second organosilane precursor is different from the first organosilane precursor, and wherein the second organosilane precursor is configured to eliminate defect sites and unreacted sites on the first layer and on a surface of the workpiece that includes the first layer.
A device comprising:
- a workpiece;
- a first layer disposed on the workpiece, wherein the first layer is formed from a first organosilane precursor, and wherein the first layer is an anti-stiction layer;
- and
- a second layer disposed on the first layer, wherein the second layer is formed from a second organosilane precursor, wherein the second organosilane precursor is different from the first organosilane precursor, and wherein the second organosilane precursor is configured to eliminate defect sites and unreacted sites on the first layer and on a surface of the workpiece that includes the first layer.
1 more element
Dependencies are inferred from the claim text.