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US 2025/0115992 A1Published application
High-purity alkynes for selective deposition
AssigneesMerck Patent GmbH, Versum Materials US, LLC, Sigma-Aldrich Co.LLC
InventorsChristopher R. CLOUGH, Christopher Jay THODE, Christopher David HOPKINS, Sergei V. IVANOV, Agnes DERECSKEI
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Abstract
The disclosed and claimed subject matter relates to high-purity alkynes substantially free of residual alkyl halides, water and/or carboxylic acids and their use (e.g., in formulations) for enhanced passivation of metallic substrates.
Claims27
A high-purity alkyne selected from the group of
- 1A
- 1B
- 1C
- 1D
- 1E
- 1F
- 1G
- 1H
- 1I
- 1J
- 1K
- 1L
- 1M
- 1N
- 1O
- 1P
- 1Q
- 1R
- 1S
- 1T
- 1U
- 1V
- 1W
- 1X
- 2A
- 2B
- 2C
- 2D
- 2E
- 2F
- 2G
- 2H
- 2I
- 2J
- 2K
- 2L
- 2M
- 2N
- 2O
- 3A
- 3B
- 3C
- 3D
- 3E
- 3F
- 3G
- 3H
- 3I
- 3J
- 3K
- 3L
- 3M
- 3N
- wherein the high-purity alkyne has a concentration of halogen-containing impurities of less than about 1000 ppm.
51 more elements
-11. (canceled)
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(canceled)
17-19. (canceled)
(canceled)
(canceled)
(canceled)
-37. (canceled)
-42. (canceled)
-53. (canceled)
-60. (canceled)
Dependencies are inferred from the claim text.