Imprinting apparatus

A method, comprising:

• forming a master template by:
• depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group;
• and
• curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule;
• depositing a silicon-based working stamp material on the anti-stick layer of the master template;
• curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures;
• and
• releasing the working stamp from the master template.

A method of using a working stamp, the working stamp having been formed by:

• forming a master template by:
• depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group;
• and
• curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule;
• depositing a silicon-based working stamp material on the anti-stick layer of the master template;
• curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures;
• and
• releasing the working stamp from the master template;
• wherein the method of using the working stamp comprises:
• imprinting the working stamp into an imprint lithography resin on a support;
• and
• curing the resin, thereby forming a sequencing surface having a replication of the plurality of nanofeatures defined therein.