Formation apparatus and method of hydroxyapatite-containing thin film

A formation apparatus of a hydroxyapatite-containing thin film, the formation apparatus comprising:

• a sputtering device which forms a thin film of a material including an antibacterial metal and hydroxyapatite on a surface of an object by sputtering, the object being an artificial joint or a dental implant;
• a hydrothermal treatment device which performs hydrothermal treatment on the object, on which the thin film is formed, using an alkaline solution;
• a first control device which controls the sputtering device;
• and
• a second control device which controls the hydrothermal treatment device,
• the sputtering device comprising:
• a first container;
• a holder provided in the first container and used to place the object, on which the thin film is yet to be formed, on a first surface;
• an electrode provided in the first container, including a second surface facing the first surface of the holder, and used to place the material on the second surface;
• and
• an inert gas filling device which fills the first container with an inert gas,
• the first control device switching a positive pole and a negative pole of the electrode at a predetermined frequency or higher, controlling the inert gas filling device to control a pressure in the first container, and controlling the sputtering device to make an atomic number ratio (calcium/phosphorus) of calcium to phosphorus in the thin film range from 1.0 to 3.0 and to make a thickness of the thin film range from 0.1 μm to 10 μm,
• the hydrothermal treatment device comprising a second container which accommodates the object, on which the thin film is formed by the sputtering device,
• the second control device performing the hydrothermal treatment, with the thin film at a temperature of 100° C. to 180° C., using the alkaline solution with a pH of 9 to 11, and adjusting a pressure in the second container by changing the temperature during the hydrothermal treatment.