Curable composition, inverted pattern forming method, film forming method, and article manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorsMASANOBU OOTSUKA, TOSHIKI ITO
Life of this patent
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Abstract
A curable composition contains a polymerizable compound, a photopolymerization initiator, and a solvent. The polymerizable compound contains a silicon compound having polymerizability, the curable composition has a viscosity of not less than 2 mPa·s and not more than 60 mPa·s at 23° C., the curable composition in a state in which the solvent is removed has a viscosity of not less than 30 mPa·s and not more than 10,000 mPa·s at 23° C., and content of the solvent with respect to the whole curable composition is not less than 5 vol % and not more than 95 vol %.
Claims17
A curable composition containing a polymerizable compound, a photopolymerization initiator, and a solvent, wherein
- the polymerizable compound contains a silicon compound having polymerizability,
- the curable composition has a viscosity of not less than 2 mPa·s and not more than 60 mPa·s at 23° C.,
- the curable composition in a state in which the solvent is removed has a viscosity of not less than 30 mPa·s and not more than 10,000 mPa·s at 23° C., and
- content of the solvent with respect to the whole curable composition is not less than 5 vol % and not more than 95 vol %.
Dependencies are inferred from the claim text.