Phthalonitrile monomers and curable composition comprising the phthalonitrile monomers
AssigneeCanon Kabushiki Kaisha
InventorsFen WAN, Weijun Liu
Life of this patent
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Abstract
A phthalonitrile monomer can have a structure of formula (1): (R2)n—X—(R1)m (1), wherein X is a substituted or unsubstituted aryl or aryl-alkyl; R1 R2 is —CH═CH2; n is 1 to 4; and m is 1-4. A curable composition can comprise a polymerizable material, wherein the polymerizable material may include the phthalonitrile monomer of formula (1).
Claims20
A phthalonitrile monomer having a structure of formula (1):
- (R2)n—X—(R1)m (1), wherein
- X is a substituted or unsubstituted aryl (Ar) or aryl-alkyl;
- R1 is
- R2 is —CH═CH2;
- n is 1 to 4;
- and m is 1 to 4.
A curable composition comprising a polymerizable material and an initiator, wherein the polymerizable material comprises a phthalonitrile monomer having a structure of formula (1):
- (R2)n—X—(R1)m (1), wherein
- X is a substituted or unsubstituted aryl or aryl-alkyl;
- R1 is
- R2 is —CH═CH2;
- n is 1 to 4;
- and m is 1-4.
A method of forming a cured layer on a substrate, comprising:
- applying a layer of a curable composition on the substrate, wherein the curable composition comprises a polymerizable material and an initiator, the polymerizable material comprising a phthalonitrile monomer having a structure of formula (1):
- (R2)n—X—(R1)m (1), wherein X is a substituted or unsubstituted aryl or aryl-alkyl;
- R1 is
- R2 is —CH═CH2;
- n is 1 to 4;
- and m is 1 to 4;
- bringing the curable composition into contact with an imprint template or a superstrate;
- polymerizing the curable composition with light or heat to form the cured layer;
- and
- removing the imprint template or superstrate from the cured layer.
Dependencies are inferred from the claim text.