Cleaning apparatus for wafer storage container

A wafer storage container cleaning apparatus comprising:

• a cleaning chamber configured to clean a wafer storage container including a shell having a hexahedral outer shape and including an opening on one surface and a gripped portion on another surface crossing the one surface with the opening, and a door detachable from the opening;
• and
• a transfer robot including a robot hand that individually grips the shell and the door, and configured to individually load the shell and the door into the cleaning chamber and individually unload the shell and the door from the cleaning chamber,
• wherein the robot hand includes:
• a shell gripping portion including a pair of first gripping claws movable toward and away from each other along a first straight line, and configured to grip the gripped portion using the pair of first gripping claws;
• and
• a door gripping portion including a pair of second gripping claws movable toward and away from each other along a second straight line intersecting the first straight line in a top view, and configure to grip the door using the pair of second gripping claws;
• and
• wherein the cleaning chamber cleans the shell with the opening facing downward.