Substrate processing apparatus and a method of processing a substrate using the same
AssigneeSamsung Electronics Co., Ltd.
InventorsChangbae PARK, Ki-ll KIM, Jongchul PARK, Jae Sik AN, Suntaek LIM
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Abstract
A substrate processing apparatus includes a process chamber providing a process space, a stage configured to support a substrate, a gas injection unit spaced upward from the stage in the process space, and a spin polarizer having a ring shape and spaced upward from the stage. The spin polarizer includes a polarizer body having a ring shape, and a thin layer on a surface of the polarizer body. The thin layer includes a ferromagnetic material.
Claims20
A substrate processing apparatus, comprising:
- a process chamber providing a process space;
- a stage configured to support a substrate;
- a gas injection unit spaced upward from the stage in the process space;
- and
- a spin polarizer having a ring shape and spaced upward from the stage,
- wherein the spin polarizer comprises:
- a polarizer body having a ring shape;
- and
- a thin layer on a surface of the polarizer body, and
- wherein the thin layer comprises a ferromagnetic material.
A substrate processing apparatus, comprising:
- a process chamber providing a process space;
- a stage configured to support a substrate;
- a gas injection unit spaced upward from the stage in the process space;
- a lower radio frequency (RF) power source electrically coupled with the stage and configured to supply alternating current (AC) power to the stage;
- and
- a spin polarizer on an edge of the stage and spaced upward from the stage,
- wherein the spin polarizer comprises:
- a polarizer body;
- and
- a thin layer at least partially surrounding at least one of an inner surface, a top surface, and a bottom surface of the polarizer body.
A method of processing a substrate, the method comprising:
- disposing the substrate in a substrate processing apparatus;
- and
- processing the substrate,
- wherein the processing of the substrate comprises:
- magnetizing a spin polarizer of the substrate processing apparatus, the spin polarizer being spaced upward from a stage in a lower portion of a process space provided by a process chamber of the substrate processing apparatus;
- and
- generating plasma using the substrate processing apparatus.
Dependencies are inferred from the claim text.