Resist composition, resist pattern formation method, and compound
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorTetsuya Matsushita
Life of this patent
Estimating the term…
Loading patent…
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorTetsuya Matsushita
Estimating the term…
A resist composition including a resin component having a constitutional unit derived from a compound represented by General Formula (a0-1) or a constitutional unit derived from a compound represented by General Formula (a0-2). In the formulae, R01 and R02 represent a hydrogen atom; L01 and L02 represent a single bond or a divalent linking group; Ar01 and Ar02 represent an aryl group substituted with iodine atoms; Xa01 represents a group which forms an alicyclic hydrocarbon group together with a carbon atom to which Ar01 is bonded; Ra02 represents a hydrocarbon group which may have a substituent; and Xa02 represents a group which forms an alicyclic hydrocarbon group together with a carbon atom to which Ra02 is bonded and a group which is bonded to Ar02 to form a condensed ring
A resist composition which generates an acid upon light exposure and whose solubility in a developing solution is changed due to an action of the acid, the resist composition comprising:
A compound represented by General Formula (a0-1′) or General Formula (a0-2),
A compound represented by General Formula (a0-1-1) or General Formula (a0-2-1),
Dependencies are inferred from the claim text.