Substrate surface treatment device and substrate surface treatment method

Abstract

Provided is a surface treatment device capable of performing surface treatment on a treatment surface of a substrate at low cost by reusing a mist of a treatment liquid introduced into a treatment chamber. The surface treatment device is a device for surface treatment of a substrate by causing a treatment liquid to adhere to the treatment surface of the substrate. The surface treatment device includes a mist generator that generates a mist of the treatment liquid; a treatment chamber that introduces the mist generated by the mist generator and causes the introduced mist to adhere to the treatment surface of the substrate; and a circulation path that circulates the mist discharged from the treatment chamber to the treatment chamber together with the mist generated by the mist generator.

Dependencies are inferred from the claim text.