Coil device for generating plasma and semiconductor equipment

Semiconductor process equipment comprising:

• a reaction chamber, a dielectric window being arranged at a top of the reaction chamber;
• a coil device arranged above the dielectric window and including a coil structure and a fixed cooling assembly configured to fix and cool the coil structure, wherein:
• the fixed cooling assembly includes a fixed body made of an insulation material, a cooling space is formed within the fixed body, the coil structure is fixedly arranged in the cooling space, the fixed body is provided with an inlet opening and an output opening communicating with the cooling space, the inlet opening is configured to transfer a cooling gas into the cooling space, and the outlet opening is configured to exhaust the cooling gas out of the cooling space;
• and
• a turbulence structure is arranged in the cooling space and is configured to change a gas flow direction in the cooling space to improve uniformity of gas distribution in the cooling space;
• an RF source configured to provide RF power to the coil structure;
• an inlet device configured to provide a cooling gas to an inlet opening;
• and
• an exhaust device configured to exhaust the cooling gas out of the cooling space.