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US 2025/0087457 A1Published application
Inverted plasma source, and method
AssigneeMKS Instruments, Inc.
InventorsGordon HILL, Ron COLLINS
Life of this patent
Estimating the term…
Abstract
A plasma source is configured to be in fluid communication with the interior of a vacuum vessel, a vacuum chamber, such as by being installed in a wall of a vacuum vessel that encloses the chamber, or in a pipe that is connected to the chamber. The plasma source may produce plasma in a line of sight of a surface to be cleaned, such as an internal surface of the vessel, which may be used for processes such as deposition or etching.
Claims20
A plasma source comprising:
- a plasma source body, wherein the plasma source body includes a dielectric material;
- a ferrite core within the plasma source body;
- an electrode within the plasma source body;
- wherein the plasma source body is configured to generate a plasma when the ferrite core is energized, with the plasma generated forming at least partially external to the plasma source body, around the ferrite core, the electrode, and the dielectric material;
- and
- a mount mechanically coupled to plasma source body, for coupling the plasma source body to a vacuum vessel with the plasma source body in fluid communication with an interior of the vacuum vessel.
3 more elements
A plasma source comprising:
- a plasma source body, wherein the plasma source body includes a dielectric material;
- a ferrite core within the plasma source body;
- an electrode within the plasma source body;
- wherein the plasma source body is configured to generate a plasma at a plasma location when the ferrite core is energized, with the plasma generated forming at least partially external to the plasma source body, around the ferrite core, the electrode, and the dielectric material;
- and
- wherein the plasma source body includes a reduced-thickness region that defines the plasma location at a shortest-loop location.
3 more elements
A plasma source comprising:
- a plasma source body, wherein the plasma source body includes a dielectric material;
- a ferrite core within the plasma source body;
- an electrode within the plasma source body;
- wherein the plasma source body is configured to generate a plasma at a plasma location when the ferrite core is energized, with the plasma generated forming at least partially external to the plasma source body, around the ferrite core, the electrode, and the dielectric material;
- wherein the plasma source body defines an inner bore;
- wherein the plasma location passes through the inner bore;
- wherein the plasma source includes a gas feed to direct gas to the plasma location;
- and
- wherein the gas feed includes gas channels that direct the gas feed radially inward to an inner bore defined by the plasma source body.
6 more elements
Dependencies are inferred from the claim text.