Ion probe with coupling to plasma
AssigneeApplied Materials, Inc.
InventorsANDREI KHOMENKO, LEONID DORF, EVGENY KAMENETSKIY, VIACHESLAV PLOTNIKOV, RAJINDER DHINDSA
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Abstract
Embodiments include a plasma processing apparatus including a chamber with an inner chamber wall. A workpiece support is within the inner chamber wall, the workpiece support for supporting a workpiece in a processing region of the chamber. An ion probe extends through the chamber and inner chamber wall and into a plasma region above the workpiece.
Claims20
An ion probe for capacitively coupling to a bulk plasma in a plasma region of a plasma processing apparatus, the ion probe comprising:
- an outer alumina tube surrounding an inner aluminum tube;
- and
- an aluminum wire extending through a portion of a center of the inner aluminum tube, the aluminum wire held by crimps.
A method for monitoring a plasma parameter, the method comprising:
- providing an ion probe extending through a chamber and inner chamber wall and into a plasma region of a plasma processing apparatus;
- and
- measuring ion density, or ion energy distribution, or both ion density and ion energy distribution of a pulsed plasma in a plasma processing apparatus using the ion probe.
A plasma processing apparatus, comprising:
- a chamber with an inner chamber wall;
- a workpiece support within the inner chamber wall, the workpiece support for supporting a workpiece in a processing region of the chamber;
- and
- an ion probe extending through the chamber and inner chamber wall and into a plasma region above the workpiece.
Dependencies are inferred from the claim text.