Detection of Probabilistic Process Windows

A system comprising:

• a lithography tool;
• a memory device storing instructions;
• and
• a processing device, coupled to the memory device and the lithography tool, the processing device executes the instructions to:
• select a first variable;
• select a second variable;
• select a response variable that depends on the first and second variable;
• determine a measurement uncertainty for the response variable;
• determine, based on a measurement of the response variable, and the measurement uncertainty for the response variable, a plurality of probabilities representing a plurality of indications of whether a plurality of points associated with a lithography process meet a specification requirement for each response variable, wherein the plurality of probabilities represent a process window;
• and
• configure, based on the process window, the lithography tool to manufacture a semiconductor device.

A tangible, non-transitory computer-readable medium storing instructions that, when executed, cause a processing device to:

• select a first variable;
• select a second variable;
• select at least one response variable that is a function of the first variable and second variable;
• determine a measurement uncertainty for each response variable;
• determine, based on a measurement of the response variable, and the measurement uncertainty for the response variable, a plurality of probabilities representing a plurality of indications of whether a plurality of points associated with a lithography process meet a specification requirement for each response variable, wherein the plurality of probabilities represent a process window;
• and
• configure, based on the process window, the lithography tool to manufacture a semiconductor device.